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2019年12月05日 |
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Highly cited papers (top 1% in Engineering worldwide): 1. Cited times: 99 Y. H. Wu, M. Y. Yang, A. Chin, and W. J. Chen, “Electrical characteristics of high quality La2O3 dielectric with equivalent oxide thickness of 5Å,” IEEE Electron Device Lett. 21, 341 (2000). 2. Cited times: 64 S. B. Chen, J. H. Lai, A. Chin, J. C. Hsieh, and J. Liu, “High density MIM capacitors using Al2O3 and AlTiOx dielectrics,” IEEE Electron Device Lett. no. 4, pp. 185-187, 2002. 3. Cited times: 85 S. Zhu, J. Chen, M.-F. Li, S. J. Lee, J. Singh, C. X. Zhu, A. Du, C.H. Tung, A. Chin, and D. L. Kwong, “N-type Schottky Barrier Source/Drain MOSFET using Ytterbium Silicide,” IEEE Electron Device Lett. 25, no. 8, pp. 565-567, 2004. 4. Cited times: 59 N. Wu, Q. Zhang, C. Zhu, D. S. H. Chan, A. Du, N. Balasubramanian, M. F. Li, A. Chin, J. K. O. Sin, and D. L. Kwong, “A TaN-HfO2-Ge pMOSFETs with novel SiH4 surface passivation,” IEEE Electron Device Lett. 25, no. 9, pp. 631-633, 2004. 5. Cited times: 56 S. Zhu, H. Y. Yu, S. J. Whang, J. H. Chen, C. Shen, C. Zhu, S. J. Lee, M. F. Li, DSH Chan, W. J. Yoo, A. Du, C. H. Tung, J. Singh, A. Chin, and D. L. Kwong, “Schottky-Barrier Source/Drain MOSFETs with High-K Gate Dielectrics and Metal Gate Electrode,” IEEE EDL 25, no. 5, pp. 268-270 (2004). 6. Cited times: 36 D. S. Yu, C. H. Huang, A. Chin, C. Zhu, M. F. Li, B. J. Cho, and D. L. Kwong, “Al2O3/Ge-On-Insulator n- and p-MOSFETs with Fully NiSi and NiGe Dual Gates,” IEEE EDL. 25, no. 3, pp. 138-140 (2004). 7. Cited times: 41 S. Zhu, R. Li, S. J. Lee, M. F. Li, A. Du, J. Singh, C. Zhu, A. Chin, and D. L. Kwong, “Germanium pMOSFETs With Schottky-Barrier Germanide S/D, High-k Gate Dielectric and Metal Gate,” IEEE Electron Device Lett. 26, no. 2, pp. 81-83, 2005
恭賀 荊鳳德教授 服務於IEEE Electron Device Letters,長達9年 impact factor of IEEE Electron Device Letters = 4.50 12/24院教評會議~頒贈講座聘書 交大電子研究所荊鳳德教授所發表的論文榮獲nanomaterials刊登期刊封面 (Cover Story) . 與俄羅斯科學院共同發表論文,成為Top Artical in Device Physics of Applied Physics Letter(APL) h-index: as high as 55! 在台灣所有電機工程系中,名列前茅
Worldwide Citation Ranking in Engineering among Authors with “Highly Cited Papers: ranked 400 ![]() Reported by “The New York Times” 紐約時報 Awards:
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上次更新此站台的日期: 2019年12月05日